GROWTH OF SILICON EPITAXY OVER ION-IMPLANTED BURIED LAYERS

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作者
KANNAN, VC [1 ]
ROPER, G [1 ]
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[1] TEKTRONIX INC,BEAVERTON,OR 97005
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O646 [电化学、电解、磁化学];
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081704 ;
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页码:C120 / C120
页数:1
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