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SOME OBSERVATIONS ON THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN SILICON
被引:208
作者
:
DROSD, R
论文数:
0
引用数:
0
h-index:
0
DROSD, R
WASHBURN, J
论文数:
0
引用数:
0
h-index:
0
WASHBURN, J
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1982年
/ 53卷
/ 01期
关键词
:
D O I
:
10.1063/1.329901
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:397 / 403
页数:7
相关论文
共 22 条
[1]
DENDRITIC GROWTH OF GERMANIUM CRYSTALS
BENNETT, AI
论文数:
0
引用数:
0
h-index:
0
BENNETT, AI
LONGINI, RL
论文数:
0
引用数:
0
h-index:
0
LONGINI, RL
[J].
PHYSICAL REVIEW,
1959,
116
(01):
: 53
-
61
[2]
Blum N. A., 1972, Journal of Non-Crystalline Solids, V11, P242, DOI 10.1016/0022-3093(72)90006-3
[3]
THE TEMPERATURE DISTRIBUTION IN PULLED GERMANIUM CRYSTALS DURING GROWTH
BRICE, JC
论文数:
0
引用数:
0
h-index:
0
BRICE, JC
WHIFFIN, PAC
论文数:
0
引用数:
0
h-index:
0
WHIFFIN, PAC
[J].
SOLID-STATE ELECTRONICS,
1964,
7
(02)
: 183
-
187
[4]
CRISTODOULIDES C, 1978, RAD EFF, V36, P73
[5]
SUBSTRATE-ORIENTATION DEPENDENCE OF EPITAXIAL REGROWTH RATE FROM SI-IMPLANTED AMORPHOUS SIA
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CSEPREGI, L
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
KENNEDY, EF
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1978,
49
(07)
: 3906
-
3911
[6]
REORDERING OF AMORPHOUS LAYERS OF SI IMPLANTED WITH P-31, AS-75, AND B-11 IONS
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
CSEPREGI, L
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
KENNEDY, EF
GALLAGHER, TJ
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
GALLAGHER, TJ
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(10)
: 4234
-
4240
[7]
REGROWTH BEHAVIOR OF ION-IMPLANTED AMORPHOUS LAYERS ON [111] SILICON
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CSEPREGI, L
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
SIGMON, TW
[J].
APPLIED PHYSICS LETTERS,
1976,
29
(02)
: 92
-
93
[8]
A NEW TECHNIQUE FOR OBSERVING THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN THIN SURFACE-LAYERS ON SILICON-WAFERS
DROSD, B
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
DROSD, B
WASHBURN, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
WASHBURN, J
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(08)
: 4106
-
4110
[9]
DROSD R, 1978, 9TH INT C EL MICR, P384
[10]
GROWTH FACETS ON III-V INTERMETALLIC COMPOUNDS
FAUST, JW
论文数:
0
引用数:
0
h-index:
0
FAUST, JW
JOHN, HF
论文数:
0
引用数:
0
h-index:
0
JOHN, HF
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(AUG)
: 1119
-
&
←
1
2
3
→
共 22 条
[1]
DENDRITIC GROWTH OF GERMANIUM CRYSTALS
BENNETT, AI
论文数:
0
引用数:
0
h-index:
0
BENNETT, AI
LONGINI, RL
论文数:
0
引用数:
0
h-index:
0
LONGINI, RL
[J].
PHYSICAL REVIEW,
1959,
116
(01):
: 53
-
61
[2]
Blum N. A., 1972, Journal of Non-Crystalline Solids, V11, P242, DOI 10.1016/0022-3093(72)90006-3
[3]
THE TEMPERATURE DISTRIBUTION IN PULLED GERMANIUM CRYSTALS DURING GROWTH
BRICE, JC
论文数:
0
引用数:
0
h-index:
0
BRICE, JC
WHIFFIN, PAC
论文数:
0
引用数:
0
h-index:
0
WHIFFIN, PAC
[J].
SOLID-STATE ELECTRONICS,
1964,
7
(02)
: 183
-
187
[4]
CRISTODOULIDES C, 1978, RAD EFF, V36, P73
[5]
SUBSTRATE-ORIENTATION DEPENDENCE OF EPITAXIAL REGROWTH RATE FROM SI-IMPLANTED AMORPHOUS SIA
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CSEPREGI, L
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
KENNEDY, EF
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1978,
49
(07)
: 3906
-
3911
[6]
REORDERING OF AMORPHOUS LAYERS OF SI IMPLANTED WITH P-31, AS-75, AND B-11 IONS
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
CSEPREGI, L
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
KENNEDY, EF
GALLAGHER, TJ
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
GALLAGHER, TJ
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(10)
: 4234
-
4240
[7]
REGROWTH BEHAVIOR OF ION-IMPLANTED AMORPHOUS LAYERS ON [111] SILICON
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
CSEPREGI, L
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91125
SIGMON, TW
[J].
APPLIED PHYSICS LETTERS,
1976,
29
(02)
: 92
-
93
[8]
A NEW TECHNIQUE FOR OBSERVING THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN THIN SURFACE-LAYERS ON SILICON-WAFERS
DROSD, B
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
DROSD, B
WASHBURN, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720
WASHBURN, J
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(08)
: 4106
-
4110
[9]
DROSD R, 1978, 9TH INT C EL MICR, P384
[10]
GROWTH FACETS ON III-V INTERMETALLIC COMPOUNDS
FAUST, JW
论文数:
0
引用数:
0
h-index:
0
FAUST, JW
JOHN, HF
论文数:
0
引用数:
0
h-index:
0
JOHN, HF
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(AUG)
: 1119
-
&
←
1
2
3
→