A NOVEL-APPROACH TO ORTHO-NITROBENZYL PHOTOCHEMISTRY FOR RESISTS

被引：63
作者：
REICHMANIS, E
WILKINS, CW
CHANDROSS, EA
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571272
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1338 / 1342
页数：5
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