SPECTROSCOPIC CHARACTERIZATION OF THIN VANADIUM CARBIDE FILMS ON A VANADIUM(110) SURFACE - FORMATION, STABILITY, AND REACTIVITIES

被引：22

作者：

CHEN, JG ^{[1
]}

DEVRIES, BD ^{[1
]}

FRUHBERGER, B ^{[1
]}

KIM, CM ^{[1
]}

LIU, ZM ^{[1
]}

机构：

[1] KYUNGPOOK NATL UNIV,DEPT CHEM,TAEGU 702701,SOUTH KOREA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579735

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The surface properties of thin vanadium carbide films, produced on a V(110) surface, have been investigated by using a combination of high-resolution electron energy-loss spectroscopy, fluorescence-yield near-edge x-ray absorption spectroscopy (FYNES), and Auger electron spectroscopy (AES). Our results indicate that thin carbide films with a stoichiometry of VC can be produced by exposing V(110) to olefin molecules at 600 K. A comparison of the bulk-sensitive FYNES data with the relatively surface-sensitive AES results suggests that the average thickness of the VC film is greater than the penetration depth of Auger electrons for the C(KLL) and {LMM) transitions. Upon heating to 600–1050 K, the thin VC films most likely undergo a thermally induced clustering process, which is followed by a diffusion of carbon atoms into the bulk V(110). The surface reactivities of the carbide-modified surfaces are significantly different from those of either clean V(110) or oxygen-modified V(110), as will be demonstrated by the interactions of these surfaces with CO and ethylene molecules. © 1995, American Vacuum Society. All rights reserved.

引用

页码：1600 / 1605

页数：6