XPS AND AES STUDY OF AL2O3/TI6AL4V INTERFACE - INFLUENCE OF OXIDATION AND NITRURATION OF THE METAL-SURFACE

被引：3

作者：

DELOGU, P ^{[1
]}

DIKONIMOSMAKRIS, T ^{[1
]}

GIORGI, R ^{[1
]}

LASCOVICH, J ^{[1
]}

CANEVE, L ^{[1
]}

SCAGLIONE, S ^{[1
]}

机构：

[1] ENEA,DIPARTIMENTO INNOVAZ,SETTORE ELETTROOTT & LASER,I-00100 ROME,ITALY

来源：

SURFACE AND INTERFACE ANALYSIS | 1994年 / 22卷 / 1-12期

关键词：

D O I：

10.1002/sia.740220152

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Important properties of the coating/substrate combination like hardness, stress and, in particular, adhesion rely partly on the morphology and microstructure of the interface, which is often physically and chemically different from the substrate as well as from the coating. The aim of this work is to study the influence of the chemical state of the metal surface on the structure of the interface Al2O3/Ti6A14V, obtained by deposition via sputtering of the ceramic. For this purpose three different surface treatments of the substrate were performed: air oxidation, cleaning by Ar+ sputtering and nitrogen ion implantation. The chemical composition of the treated surfaces was assessed by x-ray photoelectron spectroscopy, while the composition of the interfaces was investigated by Auger electron spectroscopy depth profiling.

引用

页码：236 / 241

页数：6

共 12 条

[1] QUANTITATIVE AES AND XPS INVESTIGATION OF MAGNETRON SPUTTERED TINX FILMS [J].

BENDER, H ;

PORTILLO, J ;

VANDERVORST, W .

SURFACE AND INTERFACE ANALYSIS, 1989, 14 (6-7) :337-346

[2]

HOFMANN S, 1990, PRACTICAL SURFACE AN, V1

[3] XPS ANALYSIS OF ADSORPTION OF OXYGEN MOLECULES ON THE SURFACE OF TI AND TINX FILMS IN VACUUM [J].

KUZNETSOV, MV ;

ZHURAVLEV, JF ;

GUBANOV, VA .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1992, 58 (03) :169-176

[4] XPS STUDY OF THE NITRIDES, OXIDES AND OXYNITRIDES OF TITANIUM [J].

KUZNETSOV, MV ;

ZHURAVLEV, JF ;

ZHILYAEV, VA ;

GUBANOV, VA .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1992, 58 (1-2) :1-9

[5] DEPTH PROFILING BY SIMS DEPTH RESOLUTION, DYNAMIC-RANGE AND SENSITIVITY [J].

MAGEE, CW ;

HONIG, RE .

SURFACE AND INTERFACE ANALYSIS, 1982, 4 (02) :35-41

[6]

Moulder J. F., 1992, HDB XRAY PHOTOELECTR

[7] INTERCOMPARISON OF SURFACE-ANALYSIS OF THIN ALUMINUM-OXIDE FILMS [J].

OLEFJORD, I ;

MATHIEU, HJ ;

MARCUS, P .

SURFACE AND INTERFACE ANALYSIS, 1990, 15 (11) :681-692

[8] REACTIVE DUAL ION-BEAM SPUTTERING OF OXIDE-FILMS [J].

SCAGLIONE, S ;

EMILIANI, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2702-2703

[9] XPS AND EELS STUDY OF THE VALENCE BAND ELECTRONIC-STRUCTURE OF TIN AND (TI, AL)N COATINGS AS INFLUENCED BY THE DEPOSITION PARAMETERS [J].

STRYDOM, IL ;

HOFMANN, S .

VACUUM, 1990, 41 (7-9) :1619-1623

[10]

STRYDOM IL, 1991, J ELECTRON SPECTROSC, V56, P85, DOI 10.1016/0368-2048(91)80007-H

← 1 2 →