ELECTRICAL BREAKING DOWN OF BARRIER ANODIC FILMS DURING THEIR FORMATION - COMMENT

被引：6
|
作者：
SHIMIZU, K [1 ]
机构：
[1] TOKYO CITY UNIV,ELECTROCHEM & INORGAN CHEM LAB,SETAGAYA KU,TOKYO 158,JAPAN
来源：
ELECTROCHIMICA ACTA | 1981年 / 26卷 / 11期
关键词：
D O I：
10.1016/0013-4686(81)85147-X
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1691 / 1692
页数：2
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