Preparation and characteristics study of ZnO: (Al, Cu, I) thin films by chemical spray pyrolysis

被引：4

作者：

Ismail, Raid A. ^{[1
]}

Al-Naimi, Ala ^{[1
]}

Al-Ani, Alaa A. ^{[1
]}

机构：

[1] Univ Technol Baghdad, Appl Sci Dept, Baghdad, Iraq

来源：

E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2006年 / 4卷

关键词：

ZnO; Chemical spray pyrolysis; X-ray diffrcation; Doping; Optical and electrical properties;

D O I：

10.1380/ejssnt.2006.636

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Spray pyrolysis deposition technique has been used to grow ZnO thin films doped with different dopant species (Al, Cu, I). The optical and electrical properties of films were investigated as function of dopant type and concentration. The structural characteristics of undoped and doped ZnO films were studied using X-ray diffraction (XRD). The electrical resistivity as low as 4 x 10(-2) Omega cm was obtained for ZnO: Al with 5 at.% dopant concentration. ZnO: Cu films prepared at specific conditions exhibited p-type conductivity. The optical band gap of doped ZnO films varied from 3.09 eV to 3.2 eV. XRD investigation confirmed that the doped ZnO films had preferred orientation in the direction of (101) plane.

引用

页码：636 / 639

页数：4

共 22 条

[1] ELECTRICAL, OPTICAL AND ANNEALING CHARACTERISTICS OF ZNO-AL FILMS PREPARED BY SPRAY PYROLYSIS [J].