CHEMISORPTION OF H2O ON THE SI(111) 7 X 7 SURFACES

被引：22

作者：

FUJIWARA, K

OGATA, H

机构：

[1] Central Research Laboratory, Mitsubishi Electric Corporation, Amagasaki, Hyogo

来源：

SURFACE SCIENCE | 1979年 / 86卷 / JUL期

关键词：

D O I：

10.1016/0039-6028(79)90449-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Chemisorption of H2O on the thermally cleaned Si(111) 7 × 7 surfaces has been studied by ultraviolet photoemission, energy loss and Auger electron spectroscopies. We provide direct experimental evidence that, at room temperature, the molecules non-dissociatively adsorb in a single state. It is also found that, with increasing annealing temperature up to ∼1500 K, the reaction processes proceed in three steps: molecular adsorption, dissociation and hydrogen desorption and oxygen desorption. © 1979.

引用

页码：700 / 705

页数：6

共 8 条

[1]

AUER PP, 1974, 2ND P INT C SOL SURF

[2] ADSORPTION OF H2S, H2O AND O2 ON SI(111) SURFACES [J].