HIGH-FLUX BEAMLINE FOR SMALL-ANGLE X-RAY-SCATTERING AT ELETTRA

被引：138

作者：

AMENITSCH, H ^{[1
]}

BERNSTORFF, S ^{[1
]}

LAGGNER, P ^{[1
]}

机构：

[1] SINCROTRONE TRIESTE, I-34012 TRIESTE, ITALY

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1995年 / 66卷 / 02期

关键词：

D O I：

10.1063/1.1145864

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The optical layout and the expected performance of the new high-flux SAXS beamline at ELETTRA is presented. From the high-power wiggler spectrum the three discrete energies 5.4, 8, and 16 keV will be selected with a double-crystal monochromator which contains three pairs of separated asymmetrically cut plane Si(111) crystals. Downstream, the beam will be focused by a torodial mirror. The optical axis of the beamline will be horizontally 1.25 mrad off wiggler axis and the beamline will accept about 1 mrad horizontally and 0.3 mrad vertically. The beamline will operate with a SAXS resolution between 10 and at least 1000 Å in d spacing at 8 keV and has been optimized with respect to extreme flux. A flux at the sample in the order of 1013 ph/s is expected for 8 keV photons (2 GeV, 400 mA). It will be possible to perform wide angle scattering measurements in the range of 3.5 and 7 Å d spacing at 8 keV simultaneously. © 1995 American Institute of Physics.

引用

页码：1624 / 1626

页数：3

共 12 条

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