EFFECTS OF MAGNETIC-FIELD AND MICROWAVE-POWER ON ELECTRON-CYCLOTRON RESONANCE-TYPE PLASMA CHARACTERISTICS

被引:48
作者
POPOV, OA
机构
[1] Microscience, Inc., Norwell, Massachusetts
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577349
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Microwave plasmas were excited in cylindrical cavities of 2.5-5.0 cm diam in the presence of magnetic field of 800-1000 G. Microwave cw power of 100-1000 W at a frequency of 2.45 GHz was delivered in the plasma via a matched introduction (quartz) window. It was found that microwaves could propagate in cavities with diameters smaller than cutoff through the overdense plasma (N(e) > N(cr),N(cut-off)) if the magnetic field in the plasma is higher than electron cyclotron resonance (ECR) field. When the magnetic field is lower than 875 G no detectable microwave propagation through the overdense plasma was observed. The microwave power absorption was located mainly in two sites: (i) near the vacuum window (2-3 cm) where the microwave electric field seems to have a maximum amplitude and plasma density has a steep gradient with a magnitude of N(e) almost-equal-to N(cr) (Landau damping), and (ii) at sites along the plasma chamber where the magnetic field has a value of 875 G (ECR heating). Two electron temperatures on the Langmuir probe I-V characteristics - T(e1) = 3-6 eV, and T(e2) = 7-12 eV, and effects of magnetic field and plasma density on the microwave propagation are discussed.
引用
收藏
页码:711 / 716
页数:6
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