ALKALI-DEVELOPABLE SILICONE-BASED NEGATIVE PHOTORESIST (SNP) FOR DEEP UV, ELECTRON-BEAM, AND X-RAY LITHOGRAPHIES

被引：5

作者：

BAN, H

TANAKA, A

KAWAI, Y

DEGUCHI, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.L1863

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L1863 / L1865

页数：3

共 11 条

[1]

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[3]

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[8]

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[9] NEW PHOTORESIST FOR HIGH-RESOLUTION 2-LAYER RESIST SYSTEMS [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1985, 24 (02) :L112-L114

[10] ALKALI-DEVELOPABLE SILICON CONTAINING POSITIVE PHOTORESIST (ASTRO) FOR A 2-LAYER RESIST SYSTEM - PREPARATION AND PROCESSING [J].

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NONOGAKI, S ;

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KADOTA, K .

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