FORMATION OF ULTRATHIN OXIDE-FILMS ON SILICON IN RF OXYGEN PLASMA

被引：13
|
作者：
ATANASOVA, ED
KIROV, KI
KANTARDJEVA, EI
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 64卷 / 01期
关键词：
D O I：
10.1002/pssa.2210640106
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：73 / 80
页数：8
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