APPLICATION OF UV LIGHT FOR STUDYING SURFACE-REACTIONS IN LAYER STRUCTURES

被引：9
作者：
LITOVCHENKO, VG
LISOVSKII, IP
LITVINOV, RO
机构：
来源：
APPLICATIONS OF SURFACE SCIENCE | 1980年 / 6卷 / 01期
关键词：
Compendex;
D O I：
10.1016/0378-5963(80)90051-3
中图分类号：
学科分类号：
摘要：
SEMICONDUCTOR DEVICES
引用
收藏
页码：15 / 28
页数：14
相关论文
共 23 条
[1]   HYDRIDES AND HYDROXYLS IN THIN SILICON DIOXIDE FILMS [J].
BECKMANN, KH ;
HARRICK, NJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) :614-&
[2]   TRACER EVALUATION OF HYDROGEN IN STEAM-GROWN SIO2 FILMS [J].
BURKHARD.PJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (2P1) :196-&
[3]   CONTRIBUTIONS OF OXYGEN, SILICON, AND HYDROGEN TO INTERFACE STATES OF AN SI-SIO2 INTERFACE [J].
FAHRNER, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (06) :784-787
[4]  
FEDOROVICH YV, 1975, ELEMENTARNYE FIZIKO, P137
[5]  
FEDOROVICH YV, 1972, FIZ TEKH POLUPROV, V6, P2321
[6]   INTERFACE STATES OF SI-SIO2 SYSTEM AND THEIR SEPARATION IN GROUPS [J].
FLIETNER, H ;
FUSSEL, W ;
SINH, ND .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 43 (01) :K99-K101
[7]  
Gavrilenko V. I., 1975, Ukrayins'kyi Fizychnyi Zhurnal, V20, P1868
[8]  
KIBLIK VY, 1976, POLUPROV TEKH MIKROE, V23, P84
[9]  
KISELEV VF, 1977, 6TH ALL UN C PHYS 2, P19
[10]  
KONOROV PP, 1975, FIZ TEKH POLUPROV, V9, P989
123