首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
MOSFETS WITH LOW THRESHOLD VALUE
被引:4
作者
:
SINGH, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SOUTHAMPTON,DEPT ELECTR,SOUTHAMPTON SO9 5NH,HAMPSHIRE,ENGLAND
UNIV SOUTHAMPTON,DEPT ELECTR,SOUTHAMPTON SO9 5NH,HAMPSHIRE,ENGLAND
SINGH, A
[
1
]
KEMHADJIAN, HA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SOUTHAMPTON,DEPT ELECTR,SOUTHAMPTON SO9 5NH,HAMPSHIRE,ENGLAND
UNIV SOUTHAMPTON,DEPT ELECTR,SOUTHAMPTON SO9 5NH,HAMPSHIRE,ENGLAND
KEMHADJIAN, HA
[
1
]
机构
:
[1]
UNIV SOUTHAMPTON,DEPT ELECTR,SOUTHAMPTON SO9 5NH,HAMPSHIRE,ENGLAND
来源
:
MICROELECTRONICS AND RELIABILITY
|
1980年
/ 20卷
/ 04期
关键词
:
D O I
:
10.1016/0026-2714(80)90604-6
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:533 / 534
页数:2
相关论文
共 5 条
[1]
STABILITY AND SURFACE CHARGE IN MOS SYSTEM
[J].
BADCOCK, FR
论文数:
0
引用数:
0
h-index:
0
BADCOCK, FR
;
LAMB, DR
论文数:
0
引用数:
0
h-index:
0
LAMB, DR
.
INTERNATIONAL JOURNAL OF ELECTRONICS,
1968,
24
(01)
:1
-+
[2]
Burger R M, 1967, FUNDAMENTALS SILICON, V1
[3]
EFFECT OF AMBIENT TEMPERATURE AND COOLING RATE ON SURFACE CHARGE AT SILICON/SILICON DIOXIDE INTERFACE
[J].
LAMB, DR
论文数:
0
引用数:
0
h-index:
0
LAMB, DR
;
BADCOCK, FR
论文数:
0
引用数:
0
h-index:
0
BADCOCK, FR
.
INTERNATIONAL JOURNAL OF ELECTRONICS,
1968,
24
(01)
:11
-&
[4]
FABRICATION OF SHORT CHANNEL MOSFETS WITH REFRACTORY-METAL GATES USING RF SPUTTER ETCHING
[J].
RODRIGUEZ, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
RODRIGUEZ, A
;
MISRA, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
MISRA, M
;
HESSELBOM, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
HESSELBOM, H
;
TOVE, PA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
TOVE, PA
.
SOLID-STATE ELECTRONICS,
1976,
19
(01)
:17
-&
[5]
SCOTT J, 1965, RCA REV, P357
←
1
→
共 5 条
[1]
STABILITY AND SURFACE CHARGE IN MOS SYSTEM
[J].
BADCOCK, FR
论文数:
0
引用数:
0
h-index:
0
BADCOCK, FR
;
LAMB, DR
论文数:
0
引用数:
0
h-index:
0
LAMB, DR
.
INTERNATIONAL JOURNAL OF ELECTRONICS,
1968,
24
(01)
:1
-+
[2]
Burger R M, 1967, FUNDAMENTALS SILICON, V1
[3]
EFFECT OF AMBIENT TEMPERATURE AND COOLING RATE ON SURFACE CHARGE AT SILICON/SILICON DIOXIDE INTERFACE
[J].
LAMB, DR
论文数:
0
引用数:
0
h-index:
0
LAMB, DR
;
BADCOCK, FR
论文数:
0
引用数:
0
h-index:
0
BADCOCK, FR
.
INTERNATIONAL JOURNAL OF ELECTRONICS,
1968,
24
(01)
:11
-&
[4]
FABRICATION OF SHORT CHANNEL MOSFETS WITH REFRACTORY-METAL GATES USING RF SPUTTER ETCHING
[J].
RODRIGUEZ, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
RODRIGUEZ, A
;
MISRA, M
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
MISRA, M
;
HESSELBOM, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
HESSELBOM, H
;
TOVE, PA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
UNIV UPPSALA,INST TECHNOL,ELECTR DEPT,UPPSALA,SWEDEN
TOVE, PA
.
SOLID-STATE ELECTRONICS,
1976,
19
(01)
:17
-&
[5]
SCOTT J, 1965, RCA REV, P357
←
1
→