A STUDY OF VOIDS IN SPUTTERED SIO2

被引：6
作者：
LOGAN, JS [1 ]
HAIT, MJ [1 ]
JONES, HC [1 ]
FIRTH, GR [1 ]
THOMPSON, DB [1 ]
机构：
[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.576291
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1392 / 1396
页数：5
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