MODEL OF THE DISSOLUTION OF MONO-MOLECULAR PHOTORESISTS

被引：4

作者：

BARRAUD, A

机构：

来源：

THIN SOLID FILMS | 1981年 / 85卷 / 01期

关键词：

D O I：

10.1016/0040-6090(81)90057-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：77 / 85

页数：9

共 9 条

[1]

BARRAUD A, 1979, SOLID STATE TECHNOL, V22, P120

[2] POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY [J].

BARRAUD, A ;

ROSILIO, C ;

RUAUDELTEIXIER, A .

THIN SOLID FILMS, 1980, 68 (01) :91-98

[3] RECENT IMPROVEMENTS IN MONO-MOLECULAR RESISTS [J].

BARRAUD, A ;

ROSILIO, C ;

RUAUDELTEIXIER, A .

THIN SOLID FILMS, 1980, 68 (01) :99-100

[4]

BROCHET A, 1977, 1977 P INT C MICR PA, P239

[5] MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS [J].

DILL, FH ;

NEUREUTHER, AR ;

TUTTLE, JA ;

WALKER, EJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :456-464

[6] COMPUTER-SIMULATION OF EXPOSURE AND DEVELOPMENT OF A POSITIVE PHOTORESIST [J].

FUJIMORI, S .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :615-623

[7] DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST [J].

GREENEICH, JS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (07) :970-976

[8] MODEL FOR KINEMATICS OF POLYMER DISSOLUTION [J].

TU, YO ;

OUANO, AC .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (02) :131-142

[9]

Ueberreiter K., 1968, Diffusion in Polymers, P219

← 1 →