FABRICATION OF INTEGRATED CIRCUITS USING ELECTRON IMAGE PROJECTION SYSTEM (ELIPS)

被引:15
作者
OKEEFFE, TW
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D O I
10.1109/T-ED.1970.17010
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:465 / &
相关论文
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[1]   POLYMERIC ELECTRON BEAM RESISTS [J].
KU, HY ;
SCALA, LC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) :980-&
[2]   AN ELECTRON IMAGING SYSTEM FOR FABRICATION OF INTEGRATED CIRCUITS [J].
OKEEFFE, TW ;
VINE, J ;
HANDY, RM .
SOLID-STATE ELECTRONICS, 1969, 12 (11) :841-&