LOW-LOSS SUBSTRATE FOR EPITAXIAL-GROWTH OF HIGH-TEMPERATURE SUPERCONDUCTOR THIN-FILMS

被引：235

作者：

SIMON, RW ^{[1
]}

PLATT, CE ^{[1
]}

LEE, AE ^{[1
]}

LEE, GS ^{[1
]}

DALY, KP ^{[1
]}

WIRE, MS ^{[1
]}

LUINE, JA ^{[1
]}

机构：

[1] COMMERCIAL CRYSTAL LABS INC,NAPLES,FL 33942

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 26期

关键词：

D O I：

10.1063/1.100543

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2677 / 2679

页数：3

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