THE FORMATION AND CONTROL OF DIRECT-CURRENT MAGNETRON DISCHARGES FOR THE HIGH-RATE REACTIVE PROCESSING OF THIN-FILMS

被引：84
作者：
HOWSON, RP
SPENCER, AG
OKA, K
LEWIN, RW
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.576260
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1230 / 1234
页数：5
相关论文
共 11 条
[1]  
GAUTHERIN G, 1907, 7TH P INT VAC C 3RD, P1579
[2]   ION PLATING WITH AN ARC SOURCE [J].
HATTO, PW ;
TEER, DG .
VACUUM, 1986, 36 (1-3) :67-69
[3]   REACTIVE ION PLATING OF TIO2 [J].
HOWSON, RP ;
SUZUKI, K ;
BISHOP, CA ;
RIDGE, MI .
VACUUM, 1984, 34 (1-2) :291-294
[4]  
MATTOX DM, 1977, 1977 P INT C ION PLA, P10
[5]  
OKA K, IN PRESS P SPIE
[6]   COMPOSITION CONTROL IN CONDUCTING OXIDE THIN-FILMS [J].
RIDGE, MI ;
HOWSON, RP .
THIN SOLID FILMS, 1982, 96 (02) :121-127
[7]  
SCHILLER S, 1987, 1987 P INT C ION PLA
[8]  
SCHILLER S, 1981, THIN SOLID FILMS, V83, P253
[9]   PRESSURE STABILITY IN REACTIVE MAGNETRON SPUTTERING [J].
SPENCER, AG ;
HOWSON, RP ;
LEWIN, RW .
THIN SOLID FILMS, 1988, 158 (01) :141-149
[10]   ACTIVATION OF REACTIVE SPUTTERING BY A PLASMA BEAM FROM AN UNBALANCED MAGNETRON [J].
SPENCER, AG ;
OKA, K ;
HOWSON, RP ;
LEWIN, RW .
VACUUM, 1988, 38 (8-10) :857-859
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