SILICON MONOXIDE THIN-FILMS

被引：51

作者：

RAIDER, SI

FLITSCH, R

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 11期

关键词：

D O I：

10.1149/1.2132685

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1754 / 1757

页数：4

共 19 条

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