KEV-POLYATOMIC-ION-IMPACT-NUCLEATED OXIDATIVE ETCH PITTING IN HIGHLY ORIENTED PYROLYTIC-GRAPHITE

被引：21

作者：

REIMANN, CT

SULLIVAN, PA

TURPITZ, A

ALTMANN, S

QUIST, AP

BERGMAN, A

OSCARSSON, SO

SUNDQVIST, BUR

HAKANSSON, P

机构：

[1] Division of Ion Physics, Department of Radiation Sciences, Uppsala University, S-751 21 Uppsala

来源：

SURFACE SCIENCE | 1995年 / 341卷 / 1-2期

关键词：

ATOMIC FORCE MICROSCOPY; BIOLOGICAL MOLECULES - PROTEINS; GRAPHITE; ION BOMBARDMENT; ION-SOLID INTERACTIONS; LOW INDEX SINGLE CRYSTAL SURFACES; OXIDATION; SURFACE CHEMICAL REACTION; SURFACE DEFECTS; SURFACE STRUCTURE;

D O I：

10.1016/0039-6028(95)00773-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The tendency of freshly cleaved highly oriented pyrolytic graphite (HOPG) to form nanometer-sized circular pits during high temperature oxidative etching is an example of a controllable, nanoscale tailoring of a surface with a number of potential applications. Here we explore the possibility of modulating the number density, shapes, and dimensions of such etch pits by deliberately nucleating defects at or near the surface by bombardment with kilo-electronvolt polyatomic projectiles. We observed that bombardment of HOPG by 176 keV apomyoglobin ions resulted in the nucleation of a large population of deep hexagonal etch pits upon baking. The depths of the pits also give new information on the depth to which a material is damaged by impinging energetic polyatomic projectiles.

引用

页码：L1019 / L1024

页数：6