SCANNING ION-BEAM TECHNIQUES FOR THE EXAMINATION OF MICROELECTRONIC DEVICES

被引：18

作者：

CLEAVER, JRA

KIRK, ECG

YOUNG, RJ

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584341

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1026 / 1029

页数：4

共 11 条

[1]

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[2]

CLEAVER JRA, 1983, MICROCIRCUIT ENG 83, P135

[3] REGISTRATION MARK DETECTION FOR SCANNING ION-BEAM LITHOGRAPHY [J].

EVASON, AF ;

CLEAVER, JRA ;

HEARD, PJ ;

AHMED, H .

ELECTRONICS LETTERS, 1985, 21 (14) :629-630

[4] APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J].

HEARD, PJ ;

CLEAVER, JRA ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :87-90

[5] OBSERVATION OF VOLTAGE CONTRAST IN SCANNING ION MICROSCOPY OF INTEGRATED-CIRCUITS [J].

KIRK, ECG ;

CLEAVER, JRA ;

AHMED, H .

ELECTRONICS LETTERS, 1987, 23 (11) :585-586

[6]

KIRK ECG, 1987, I PHYS C SER, V87, P691

[7] ION CHANNELING EFFECTS IN SCANNING ION MICROSCOPY WITH A 60 KEV GA+ PROBE [J].

LEVISETTI, R ;

FOX, TR ;

LAM, K .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 205 (1-2) :299-309

[8]

LISCHKE B, 1983, MICROCIRCUIT ENG 83, P465

[9]

Oatley C.W., 1957, J ELECTRON CONTR, V2, P568

[10]

SMITH B, 1977, ION IMPLANTATION RAN

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