CHARACTERIZATION OF POTASSIUM TANTALUM NIOBATE FILMS FORMED BY METALORGANIC DEPOSITION

被引：25
作者：
MANTESE, JV
MICHELI, AL
SCHUBRING, NW
CATALAN, AB
CHEN, YL
WALDO, RA
WONG, CA
机构：
[1] General Motors Research Laboratories, Warren
来源：
JOURNAL OF APPLIED PHYSICS | 1992年 / 72卷 / 02期
关键词：
D O I：
10.1063/1.351842
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Thin films of potassium tantalum niobate, KTa0.6Nb0.4O3, with a Curie temperature of 20-degrees-C were deposited on a variety of substrates by metalorganic deposition. These films had peak relative permittivities of 16 000 at 20-degrees-C. Hysteresis plots of electric displacement as a function of electric field, taken at 0-degrees-C, revealed a coercive field of 800 V/cm, a spontaneous polarization of 3.9-mu-C/cm2, and a remnant polarization of 0.5-mu-C/cm2. The hysteresis loops did not change significantly as the temperature was varied down to -100-degrees-C.
引用
收藏
页码：615 / 619
页数：5
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