ELECTRON-BEAM DEPOSITION OF GOLD NANOSTRUCTURES IN A REACTIVE ENVIRONMENT

被引：77

作者：

FOLCH, A ^{[1
]}

TEJADA, J ^{[1
]}

PETERS, CH ^{[1
]}

WRIGHTON, MS ^{[1
]}

机构：

[1] UNIV BARCELONA,FAC FIS,E-08027 BARCELONA,SPAIN

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 16期

关键词：

D O I：

10.1063/1.113909

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron beam deposition (EBD) is a maskless technique suitable for the fabrication of nanometer scale structures. Metals can be deposited from an organometallic gas, but simultaneous carbon deposition typically yields grossly impure (∼25% metal) deposits. We have found that the metal content of the deposited solid is dramatically improved by performing the whole EBD process in a reactive gaseous environment containing a source of oxygen (O2orH2O) in addition to the organometallic gas. With simple procedures we prepared Au deposits showing significantly diminished C content (up to 50% metal) as the partial pressure of O2 (or H2O) is increased in the gas.© 1995 American Institute of Physics.

引用

页码：2080 / 2082

页数：3

共 10 条

[1] ATOMIC FORCE MICROSCOPE [J].