DESIGN AND CERTIFICATION OF HIGH-PURITY DELIVERY SYSTEMS FOR SEMICONDUCTOR WAFER CLEANING CHEMICALS

被引:0
作者
GRANT, DC
SMITH, D
PALM, P
WANG, FC
CHAREST, D
CAMPANERIA, J
WAI, LS
LYE, I
YEO, SK
SING, CK
TEY, KY
KAUR, D
机构
来源
JOURNAL OF THE IES | 1994年 / 37卷 / 06期
关键词
CONTAMINATION CONTROL; BULK CHEMICAL DELIVERY; PARTICLE CONTAMINATION; METAL ION CONTAMINATION; CHEMICAL COMPATIBILITY; SEMICONDUCTOR CLEANING CHEMICALS;
D O I
暂无
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The wafer cleaning procedures used in new semi-conductor manufacturing facilities require extremely high purity chemicals. Delivering chemicals of this quality requires careful management of the chemicals from their manufacturing site to the points of use (POUs) within the wafer fabrication facility (fab). Chemical management includes proper chemical production, transportation to the wafer fab and design and operation of the chemical delivery system within the fab. This paper describes the technology used to supply 15 different types of chemicals to more than 60 POUs in the TECH Semiconductor wafer fab in Singapore. The certification and continuous monitoring program confirms sub-ppb chemical delivery with particle concentrations of < 3 particles/ml at greater-than-or-equal-to 0.2 mum. Several challenges associated with the initial design and installation of the chemical delivery system and their resolution are also described.
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页码:32 / 40
页数:9
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