LOW-NOISE GAAS FIELD-EFFECT TRANSISTORS PREPARED BY MOLECULAR-BEAM EPITAXY

被引:5
作者
OMORI, M
DRUMMOND, TJ
MORKOC, H
机构
[1] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801
[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
关键词
D O I
10.1063/1.92796
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:566 / 569
页数:4
相关论文
共 18 条
[1]   LOW-NOISE MICROWAVE FETS FABRICATED BY MOLECULAR-BEAM EPITAXY [J].
BANDY, SG ;
COLLINS, DM ;
NISHIMOTO, CK .
ELECTRONICS LETTERS, 1979, 15 (08) :218-219
[2]   NON-ALLOYED OHMIC CONTACTS TO NORMAL-GAAS BY MOLECULAR-BEAM EPITAXY [J].
BARNES, PA ;
CHO, AY .
APPLIED PHYSICS LETTERS, 1978, 33 (07) :651-653
[3]   SINGLE-CRYSTAL-ALUMINUM SCHOTTKY-BARRIER DIODES PREPARED BY MOLECULAR-BEAM EPITAXY (MBE) ON GAAS [J].
CHO, AY ;
DERNIER, PD .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (06) :3328-3332
[4]   GAAS MESFET PREPARED BY MOLECULAR-BEAM EPITAXY (MBE) [J].
CHO, AY ;
CHEN, DR .
APPLIED PHYSICS LETTERS, 1976, 28 (01) :30-31
[5]  
CHO AY, 1971, J VAC SCI TECHNOL, V8, P531
[6]  
CHO AY, 1975, PROGR SOLID STATE CH, V10
[7]  
COOKE HF, 1978, WORKSHOP COMPOUND SE
[8]   NON-ALLOYED AND INSITU OHMIC CONTACTS TO HIGHLY DOPED N-TYPE GAAS LAYERS GROWN BY MOLECULAR-BEAM EPITAXY (MBE) FOR FIELD-EFFECT TRANSISTORS [J].
DILORENZO, JV ;
NIEHAUS, WC ;
CHO, AY .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :951-954
[9]  
HOOPER WW, 1977, IEEE INT ELECTRON DE, P601
[10]   IMPROVED GAAS MESFET WITH A THIN INSITU BUFFER GROWN BY LIQUID-PHASE EPITAXY [J].
KIM, CK ;
MALBON, RM ;
OMORI, M .
APPLIED PHYSICS LETTERS, 1978, 33 (01) :92-94