STUDY OF INSULATOR MATERIALS USED IN ISFET GATES

被引:26
作者
COHEN, RM
HUBER, RJ
JANATA, J
URE, RW
MOSS, SD
机构
关键词
D O I
10.1016/0040-6090(78)90031-7
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:169 / 173
页数:5
相关论文
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