ISOCHRONAL ANNEALING OF NEUTRON TRANSMUTATION DOPED SILICON

被引:0
|
作者
GLAIRON, PJ [1 ]
MEESE, JM [1 ]
机构
[1] UNIV MISSOURI,COLUMBIA,MO 65201
来源
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1978年 / 23卷 / 03期
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:289 / 289
页数:1
相关论文
共 50 条
  • [1] RECOVERY OF RADIATION-DAMAGE IN NEUTRON TRANSMUTATION DOPED SILICON BY ISOCHRONAL AND ISOTHERMAL ANNEALING
    MATTERA, A
    BRAGLIA, R
    DOMENICI, M
    GIULIANI, A
    MATERIALS CHEMISTRY, 1979, 4 (03): : 513 - 526
  • [2] RAPID THERMAL ANNEALING OF NEUTRON TRANSMUTATION DOPED SILICON
    LAWSON, EM
    LEE, PJ
    JOURNAL OF ELECTRONIC MATERIALS, 1989, 18 (01) : 1 - 5
  • [3] Athermal annealing of neutron-transmutation-doped silicon
    Grun, J
    Manka, CK
    Hoffman, CA
    Meyer, JR
    Glembocki, J
    Qadri, SB
    Skelton, EF
    Donnelly, D
    Covington, B
    SHOCK COMPRESSION OF CONDENSED MATTER - 1997, 1998, 429 : 981 - 984
  • [4] RAPID THERMAL ANNEALING OF NEUTRON TRANSMUTATION DOPED SILICON
    BISCHOFF, L
    KOGLER, R
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1989, 113 (02): : K185 - K188
  • [5] ANNEALING BEHAVIOR OF DEFECTS IN NEUTRON TRANSMUTATION DOPED SILICON
    MENG, XT
    CHARALAMBOUS, S
    CHARDALAS, M
    DEDOUSSIS, SP
    ELEFTHERIADIS, CA
    LIOLIOS, AK
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1995, 133 (01): : 97 - 101
  • [6] ELECTRON TRAP ANNEALING IN NEUTRON TRANSMUTATION DOPED SILICON
    GULDBERG, J
    APPLIED PHYSICS LETTERS, 1977, 31 (09) : 578 - 579
  • [7] ANNEALING BEHAVIOR OF NEUTRON-TRANSMUTATION DOPED SILICON - AS STUDIED BY EPR
    KAUFMANN, U
    MITLEHNER, H
    JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) : 3258 - 3260
  • [8] CHARACTERISTICS OF ANNEALING OF RECOMBINATION CENTERS IN NEUTRON-TRANSMUTATION-DOPED SILICON
    KOLKOVSKII, II
    SHUSHA, VV
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1987, 21 (11): : 1195 - 1197
  • [9] EPR STUDY OF ANNEALING BEHAVIOR OF NEUTRON-TRANSMUTATION-DOPED SILICON
    STETTER, G
    COUFAL, H
    LUSCHER, E
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 49 (01): : K17 - K20
  • [10] ANNEALING BEHAVIOR OF EXCESS CARRIERS IN NEUTRON-TRANSMUTATION-DOPED SILICON
    MAEKAWA, T
    NOGAMI, S
    INOUE, S
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1993, 8 (03) : 459 - 467