ATR/FT-IR STUDY OF VANADIUM PENTOXIDE GEL FILMS ON SEMICONDUCTOR SUBSTRATES

被引：2

作者：

BAY, NTB ^{[1
]}

TIEN, PM ^{[1
]}

BADILESCU, S ^{[1
]}

DJAOUED, Y ^{[1
]}

BADER, G ^{[1
]}

GIROUARD, FE ^{[1
]}

TRUONG, VV ^{[1
]}

机构：

[1] UNIV MONCTON,DEPT PHYS,MONCTON,NB E1A 3E9,CANADA

来源：

APPLIED SPECTROSCOPY | 1995年 / 49卷 / 09期

关键词：

ATR SPECTROSCOPY; THIN FILMS; VANADIUM PENTOXIDE; SOL-GEL DEPOSITION;

D O I：

10.1366/0003702953965335

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Deposition of the vanadium pentoxide on a KRS-5 ATR crystal by dip-coating has led to the formation of a thallium bronze. ATR spectroscopy is used to study the changes in the spectral pattern induced by the heat treatment of the films. The results show that both the spectrum of the xerogel and its evolution depend on the precursors and the method of preparation. The spectra of the heated thin films suggest an irreversible structural change taking place at a temperature around 220 degrees C.

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收藏

页码：1279 / 1281

页数：3

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