A SYSTEM AND PERFORMANCE OVERVIEW OF THE EXTRION-220 MEDIUM-CURRENT ION IMPLANTER

被引：1
|
作者：
PIPPINS, MW
机构：
[1] Varian Ion Implant Systems, Gloucester, MA 01930, Blackburn Industrial Park
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 55卷 / 1-4期
关键词：
D O I：
10.1016/0168-583X(91)96205-Y
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The EXTRION 220 was the first parallel scan/200 mm serial medium-current ion implanter introduced to the market (May of 1987). Since 1987, the EXTRION 220 has been utilized in advanced device development and production. Performance enhancements developed for advanced applications in the areas of particulate reduction and beam purity are discussed. The paper begins with a description of the basic EXTRION 220 design.
引用
收藏
页码：423 / 427
页数：5
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