FORMATION OF A THIN-FILM OF POLY(OCTADECYL METHACRYLATE) USING THE PHYSICAL VAPOR-DEPOSITION TECHNIQUE

被引：12

作者：

TAMADA, M

ASANO, M

YOSHIDA, M

KUMAKURA, M

机构：

[1] Takasaki Radiation Chemistry Establishment, Japan Atomic Energy Research Institute, Takasaki, Gunma, 370-12

来源：

POLYMER | 1991年 / 32卷 / 11期

关键词：

PHYSICAL VAPOR DEPOSITION; POLY(OCTADECYL METHACRYLATE); ORIENTATION; RADICAL-INDUCED POLYMERIZATION; THIN FILM;

D O I：

10.1016/0032-3861(91)90174-H

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Octadecyl methacrylate (ODMA) was deposited in the presence of red-hot wolfram filament. It was found that radical-initiated polymerization of ODMA occurred during its deposition. The polymer yield increased in conditions of high filament temperature, low deposition rate and high substrate temperature. Low deposition rate and high temperature (up to 280 K) affected the orientation of the deposited film. A low degree of supersaturation led to high polymer yields and improved orientation. The annealed deposited film has a structure like that of a Langmuir-Blodgett film.

引用

页码：2064 / 2069

页数：6

共 25 条

[1] POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY [J].