RHEED STUDY OF ALKALI-METALS ON SI(111) SURFACE

被引：26
作者：
MIZUNO, S
ICHIMIYA, A
机构：
[1] Nagoya Univ, Japan
来源：
APPLIED SURFACE SCIENCE | 1988年 / 33-4卷
关键词：
Electrons--Diffraction - Potassium and Alloys--Diffraction - Semiconducting Silicon--Surfaces - Semiconductor Materials--Spectroscopic Analysis - Surfaces--Structure;
D O I：
10.1016/0169-4332(88)90285-1
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Adsorbed structures of Li or K on a Si(111) surface are investigated by RHEED and AES. For Li adsorption on a Si(111) surface, the RHEED pattern is changed from 7×7 to 1×1 with deposition time. Subsequent heating of the Si(111)1×1Li surface results in a 4×4 structure. Experimental data indicate that for adsorption of Li on the Si surface, twelve SiLi3 clusters are formed on the first layer by cutting backbonds of the adatoms of the dimer-adatom-stacking-fault (DAS) structure. For K adsorption on a Si(111) surface, saturation coverage is observed at room temperature. At the saturation coverage the RHEED pattern is quite different from that of Si(111)7×7Li.
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页码：38 / 44
页数：7
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