GROWTH OF EPITAXIAL ZNO THIN-FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION

被引：116
|
作者：
LAU, CK
TIKU, SK
LAKIN, KM
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
10.1149/1.2130012
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1843 / 1847
页数：5
相关论文
共 50 条
  • [1] GROWTH OF ZNO THIN-FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    LAU, CK
    TIKU, SK
    LAKIN, KM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C372 - C372
  • [2] GROWTH AND CHARACTERIZATION OF HETEROEPITAXIAL ZNO THIN-FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    SOULETIE, P
    BETHKE, S
    WESSELS, BW
    PAN, H
    JOURNAL OF CRYSTAL GROWTH, 1988, 86 (1-4) : 248 - 251
  • [3] EPITAXIAL-GROWTH OF BATIO3 THIN-FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    WILLS, LA
    WESSELS, BW
    RICHESON, DS
    MARKS, TJ
    APPLIED PHYSICS LETTERS, 1992, 60 (01) : 41 - 43
  • [4] EPITAXIAL PBTIO3 THIN-FILMS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    DEKEIJSER, M
    DORMANS, GJM
    CILLESSEN, JFM
    DELEEUW, DM
    ZANDBERGEN, HW
    APPLIED PHYSICS LETTERS, 1991, 58 (23) : 2636 - 2638
  • [5] GROWTH AND CHARACTERIZATION OF THIN-FILMS OF THALLIUM(III) OXIDE BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    BERRY, AD
    HOLM, RT
    MOWERY, RL
    TURNER, NH
    FATEMI, M
    CHEMISTRY OF MATERIALS, 1991, 3 (01) : 72 - 77
  • [6] CHEMICAL VAPOR-DEPOSITION OF EPITAXIAL ZNO FILMS
    QUON, HH
    MALANKA, DP
    MATERIALS RESEARCH BULLETIN, 1975, 10 (05) : 349 - 354
  • [7] CHEMICAL VAPOR-DEPOSITION OF INORGANIC THIN-FILMS USING ORGANOMETALLIC PRECURSORS
    INTERRANTE, LV
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1987, 194 : 192 - PHYS
  • [8] SUBSTRATE EFFECTS ON THE EPITAXIAL-GROWTH OF ZNGEP2 THIN-FILMS BY OPEN TUBE ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    XING, GC
    BACHMANN, KJ
    POSTHILL, JB
    TIMMONS, ML
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (08) : 4286 - 4291
  • [9] EPITAXIAL GARNET-FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    COWHER, ME
    SEDGWICK, TO
    LANDERMANN, J
    JOURNAL OF ELECTRONIC MATERIALS, 1974, 3 (03) : 621 - 633
  • [10] THE CHEMICAL VAPOR-DEPOSITION OF SILICON THIN-FILMS
    SCOTT, BA
    ESTES, RD
    BEACH, DB
    SILICON CHEMISTRY, 1988, : 367 - 375
12345