SILICON-BASED OPTOELECTRONICS

被引:645
作者
SOREF, RA
机构
[1] Rome Laboratory (AFMC), Electromagnetics and Reliability Directorate, Hanscom Air Force Base, MA
关键词
D O I
10.1109/5.248958
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The decade of the 1990's is an opportune time for scientists and engineers to create cost-effective silicon ''superchips'' that merge silicon photonics with advanced silicon electronics on a silicon substrate. We can expect significant electrooptical devices from Column IV materials (Si, Ge, C, and Sn) for a host of applications. The best devices will use strained-layer epitaxy, doped heterostructures, and bandgap engineering of quantum-confined structures. This paper reviews Si-based photonic components and optoelectronic integration techniques, both hybrid and monolithic.
引用
收藏
页码:1687 / 1706
页数:20
相关论文
共 216 条
[1]   ENGINEERING THE FUTURE OF ELECTRONICS [J].
ABSTREITER, G .
PHYSICS WORLD, 1992, 5 (03) :36-39
[2]  
ALBARES DJ, 1986, SPIE P, V704, P23
[3]  
[Anonymous], 1985, HDB OPTICAL CONSTANT
[4]  
ARIENZO M, 1992, FAL MAT RES SOC M AB, P170
[5]   VERTICALLY INTEGRATED HIGH-SILICA CHANNEL WAVE-GUIDES ON SI [J].
BARBAROSSA, G ;
LAYBOURN, PJR .
ELECTRONICS LETTERS, 1992, 28 (05) :437-438
[6]   SILICON-BASED SEMICONDUCTOR HETEROSTRUCTURES - COLUMN-IV BANDGAP ENGINEERING [J].
BEAN, JC .
PROCEEDINGS OF THE IEEE, 1992, 80 (04) :571-587
[7]   DESIGN AND FABRICATION OF ASYMMETRIC STRAINED-LAYER MIRRORS FOR OPTOELECTRONIC APPLICATIONS [J].
BEAN, JC ;
PETICOLAS, LJ ;
HULL, R ;
WINDT, DL ;
KUCHIBHOTLA, R ;
CAMPBELL, JC .
APPLIED PHYSICS LETTERS, 1993, 63 (04) :444-446
[8]  
BEAN JC, 1992, FAL MAT RES SOC M AB, P158
[9]  
BLOOM DM, 1993, FEB DARPA OPT REV C
[10]   OPTICAL-EMISSION FROM IMPURITIES WITHIN AN EPITAXIAL-SILICON OPTICAL WAVE-GUIDE [J].
BROWN, TG ;
BRADFIELD, PL ;
HALL, DG ;
SOREF, RA .
OPTICS LETTERS, 1987, 12 (09) :753-755