XPS Study of Niobium and Niobium-Nitride Nanofilms

被引：7

作者：

Lubenchenko, A. V. ^{[1
]}

Batrakov, A. A. ^{[1
]}

Shurkaeva, I. V. ^{[1
]}

Pavolotsky, A. B. ^{[2
]}

Krause, S. ^{[2
]}

Ivanov, D. A. ^{[1
]}

Lubenchenko, O. I. ^{[1
]}

机构：

[1] Natl Res Univ, Moscow Power Engn Inst, Moscow 111250, Russia

[2] Chalmers Univ Technol, S-41296 Gothenburg, Sweden

来源：

JOURNAL OF SURFACE INVESTIGATION | 2018年 / 12卷 / 04期

关键词：

XPS; XPS background; depth profiling; thin films; niobium; niobium nitride;

D O I：

10.1134/S1027451018040134

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

A new, XPS-based approach to quantitative and nondestructive determination of the chemical and phase layer composition of multicomponent multilayer films is proposed. It includes a new method for subtracting the background of repeatedly inelastically scattered photoelectrons, taking into account the inhomogeneity of inelastic scattering over depth; a new way of decomposing a photoelectron line into component peaks, taking into account the physical nature of various decomposition parameters; solution of the problem of subtracting the background and decomposing the photoelectron line simultaneously; and determination of the thickness of the layers of a multilayer target using a simple equation. The phase-layer composition of nanoscale Nb and NbN films is determined, and the thicknesses of these layers are calculated.

引用

页码：692 / 700

页数：9

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