PLASMA-ETCHING OF III-V-COMPOUND SEMICONDUCTOR-MATERIALS AND THEIR OXIDES

被引：77
作者：
SMOLINSKY, G
CHANG, RP
MAYER, TM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 01期
关键词：
D O I：
10.1116/1.570690
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：12 / 16
页数：5
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