MODELING AND SIMULATION OF HIGH-DENSITY PLASMAS

被引：32

作者：

GRAVES, DB

WU, HM

PORTEOUS, RK

机构：

[1] University of California, CA, 94720, Berkeley

[2] Research School of Physical Sciences and Engineering, Australian National University, Canberra, ACT, 2601

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 6B期

关键词：

PLASMA SIMULATION; HIGH DENSITY PLASMA SOURCES; ELECTRON CYCLOTRON RESONANCE;

D O I：

10.1143/JJAP.32.2999

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

引用

页码：2999 / 3006

页数：8

共 30 条

[1] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J].

ASMUSSEN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :883-893

[2] PARTICLE-IN-CELL CHARGED-PARTICLE SIMULATIONS, PLUS MONTE-CARLO COLLISIONS WITH NEUTRAL ATOMS, PIC-MCC [J].

BIRDSALL, CK .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :65-85

[3]

BOWDEN MD, 1992, UNPUB J APPL PHY AUG

[4]

BURKE RR, 1988, SOLID STATE TECHNOL, V31, P67

[5] OPERATIONAL CHARACTERISTICS OF SF6 ETCHING IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA REACTOR [J].

CECCHI, JL ;

STEVENS, JE ;

JARECKI, RL ;

HUANG, YC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :318-324

[6]

COLGAN LH, 1982, NUMERICAL SOLUTIONS, P374

[7] LASER-INDUCED FLUORESCENCE MEASUREMENTS OF TRANSVERSE ION TEMPERATURE IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].

DENHARTOG, EA ;

PERSING, H ;

WOODS, RC .

APPLIED PHYSICS LETTERS, 1990, 57 (07) :661-663

[8] PLASMA CHARACTERIZATION FOR A DIVERGENT FIELD ELECTRON-CYCLOTRON RESONANCE SOURCE [J].

FORSTER, J ;

HOLBER, W .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :899-902

[9]

Golant V.E., 1980, FUNDAMENTALS PLASMA

[10]

GORBATKIN SM, 1990, J VAC SCI TECHNOL A, V8, P2983

← 1 2 3 →