Negative voltage bandgap reference with multilevel curvature compensation technique

被引:0
作者
Liu Xi [1 ]
Liu Qian [1 ,2 ]
Jin Xiaoshi [1 ]
Zhao Yongrui [2 ,3 ]
Lee, Jong-Ho [4 ,5 ]
机构
[1] Shenyang Univ Technol, Sch Informat Sci & Engn, Shenyang 110870, Peoples R China
[2] North China Integrated Circuit Design CO Ltd, Shijiazhuang 050200, Peoples R China
[3] CETC, Res Inst 13, Shijiazhuang 050051, Peoples R China
[4] Seoul Natl Univ, Sch EECS Engn, Seoul 151742, South Korea
[5] Seoul Natl Univ, ISRC, Seoul 151742, South Korea
关键词
negative voltage bandgap reference; ECC; multilevel curvature-compensation; TC; line regulation;
D O I
10.1088/1674-4926/37/5/055008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A novel high-order curvature compensation negative voltage bandgap reference (NBGR) based on a novel multilevel compensation technique is introduced. Employing an exponential curvature compensation (ECC) term with many high order terms in itself, in a lower temperature range (TR) and a multilevel curvature compensation (MLCC) term in a higher TR, a flattened and better effect of curvature compensation over the TR of 165 degrees C (-40 to 125 degrees C) is realised. The MLCC circuit adds two convex curves by using two sub-threshold operated NMOS. The proposed NBGR implemented in the Central Semiconductor Manufacturing Corporation (CSMC) 0.5 mu m BCD technology demonstrates an accurate voltage of -1.183 V with a temperature coefficient (TC) as low as 2.45 ppm/degrees C over the TR of 165 degrees C at a -5.0 V power supply; the line regulation is 3 mV/V from a -5 to -2 V supply voltage. The active area of the presented NBGR is 370 x 180 mu m(2).
引用
收藏
页数:7
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