THE EFFECT OF PHOSPHORUS ION-IMPLANTATION ON MOLYBDENUM-SILICON CONTACTS

被引：28
|
作者：
CHIANG, SW [1 ]
CHOW, TP [1 ]
REIHL, RF [1 ]
WANG, KL [1 ]
机构：
[1] UNIV CALIF LOS ANGELES,LOS ANGELES,CA 90027
来源：
JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 06期
关键词：
D O I：
10.1063/1.329268
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4027 / 4032
页数：6
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