THE EFFECT OF PHOSPHORUS ION-IMPLANTATION ON MOLYBDENUM-SILICON CONTACTS

被引：28

作者：

CHIANG, SW ^{[1
]}

CHOW, TP ^{[1
]}

REIHL, RF ^{[1
]}

WANG, KL ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,LOS ANGELES,CA 90027

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 06期

关键词：

D O I：

10.1063/1.329268

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4027 / 4032

页数：6

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