LOW-TEMPERATURE GROWTH OF THE INFINITE LAYER PHASE OF SRCUO2 BY PULSED LASER DEPOSITION

被引：21
作者：
NIU, C
LIEBER, CM
机构：
[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138
[2] HARVARD UNIV,DIV APPL SCI,CAMBRIDGE,MA 02138
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1992年 / 114卷 / 09期
关键词：
D O I：
10.1021/ja00035a070
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：3570 / 3571
页数：2
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