METAL EDGE COVERAGE AND CONTROL OF CHARGE ACCUMULATION IN RF SPUTTERED INSULATORS

被引：40
作者：
LOGAN, JS
MADDOCKS, FS
DAVIDSE, PD
机构：
来源：
IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1970年 / 14卷 / 02期
关键词：
D O I：
10.1147/rd.142.0182
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
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页码：182 / &
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