DEPOSITION OF A-SI-H FILMS WITH A REMOTE HYDROGEN PLASMA

被引：0
|
作者：
JOHNSON, NM
WALKER, J
DOLAND, CM
WINER, K
STREET, RA
机构：
来源：
AMORPHOUS SILICON TECHNOLOGY - 1989 | 1989年 / 149卷
关键词：
D O I：
10.1557/PROC-149-39
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：39 / 43
页数：5
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