FORMATION OF CA SILICIDES IN INSULATING CAF2 LAYERS BY ION-IMPLANTATION

被引：0
|
作者：
THOMAS, A [1 ]
GEILER, HD [1 ]
机构：
[1] UNIV JENA,INST FESTKORPERPHYS,FAK PHYS ASTRON,O-6900 JENA,GERMANY
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1991年 / 124卷 / 01期
关键词：
D O I：
10.1002/pssa.2211240141
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：K19 / K22
页数：4
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