OPTICAL-ABSORPTION AND STRUCTURAL CHARACTERIZATION OF REACTIVELY SPUTTERED TELLURIUM SUBOXIDE THIN-FILMS

被引：7

作者：

DIGIULIO, M ^{[1
]}

NICOTRA, MC ^{[1
]}

RE, M ^{[1
]}

RELLA, R ^{[1
]}

SICILIANO, P ^{[1
]}

机构：

[1] CNR,IST MAT ELETTRON,I-73100 LECCE,ITALY

来源：

APPLIED SURFACE SCIENCE | 1993年 / 65-6卷

关键词：

D O I：

10.1016/0169-4332(93)90678-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Tellurium suboxide (TeOx) thin films were deposited on non-intentionally heated fused quartz substrates by RF reactive sputtering, with x = 1.3, as calculated from Rutherford backscattering spectroscopy measurements. Optical studies were performed in air at room temperature for both as-deposited and thermally annealed (250-degrees-C for 5 min in Ar atmosphere) films. The refractive index n and the extinction coefficient k were evaluated through transmissivity and reflectivity measurements at room temperature in the range of wavelengths between 200 and 1500 nm. The optical absorption spectrum as a function of the incident photon energy was also determined in order to evaluate the optical gap. Finally electron microscopy analysis has revealed that the film structure attains a shorter range order after the annealing.

引用

页码：313 / 318

页数：6

共 10 条

[1]

ANTONINI B, 1990, VUOTO, V20, P409

[2] COMPOSITIONAL AND OPTICAL CHARACTERIZATION OF RF SPUTTER DEPOSITED TEOX THIN-FILMS FOR OPTICAL DISK APPLICATION [J].