FORMATION OF METASTABLE C49 STRUCTURE IN TITANIUM DISILICIDE FILMS

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MAKOGON, YN
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[1]   THE METASTABLE C49 STRUCTURE IN SPUTTERED TISI2 THIN-FILMS [J].
BRETSCHNEIDER, W ;
BEDDIES, G ;
SCHOLZ, R .
THIN SOLID FILMS, 1988, 158 (02) :255-263
[2]  
BRIK VD, 1990, FIZ MET METALLOVED, V63, P136
[3]  
DONDE AL, 1988, VOPR AT ENERG TE OYE, P71
[4]  
DVORKINA LA, 1989, MATERIALS NEW TECHNO
[5]   KINETICS OF TISI2 FORMATION BY THIN TI FILMS ON SI [J].
HUNG, LS ;
GYULAI, J ;
MAYER, JW ;
LAU, SS ;
NICOLET, MA .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) :5076-5080
[6]  
MAKOGON YN, 1991, IAN SSSR NEORG MATER, V24, P18
[7]   INTERACTIONS OF THIN TI FILMS WITH SI, SIO2, SI3N4, AND SIOXNY UNDER RAPID THERMAL ANNEALING [J].
MORGAN, AE ;
BROADBENT, EK ;
RITZ, KN ;
SADANA, DK ;
BURROW, BJ .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (01) :344-353
[8]  
MURARKA SR, 1986, SILICIDES VERY LARGE
[9]  
Nikolin B. I., 1971, Fizika Metallov i Metallovedenie, V32, P871
[10]  
NIKOLIN BI, 1975, FIZ MET METALLOVED+, V39, P124