ELECTRON-IRRADIATION OF POLYMERS AND ITS APPLICATION TO RESISTS FOR ELECTRON-BEAM LITHOGRAPHY

被引：0
作者：
BOWDEN, MJ [1 ]
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源：
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES | 1978年 / 8卷 / 03期
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D O I：
暂无
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
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页码：223 / 264
页数：42
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