ELECTRON-IRRADIATION OF POLYMERS AND ITS APPLICATION TO RESISTS FOR ELECTRON-BEAM LITHOGRAPHY

被引:0
作者
BOWDEN, MJ [1 ]
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES | 1978年 / 8卷 / 03期
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:223 / 264
页数:42
相关论文
共 95 条
[1]   ELECTRON-BEAM FABRICATION OF CHROMIUM MASTER MASKS [J].
BALLANTYNE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1257-1260
[2]  
BALLANTYNE JP, 1975, PREPR ACS DIV ORG CO, V35, P235
[3]   PREPARATION AND CHARACTERIZATION OF A NEW, HIGHLY SENSITIVE, CROSSLINKING ELECTRON RESIST [J].
BARTELT, JL ;
FEIT, ED .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (04) :541-544
[4]  
BARTELT JL, 1973, PREPRINT ACS DIV ORG, V33, P390
[5]  
BIRKHOFF RD, 1958, HDB PHYSIK, V34, P53
[6]   POLY(STYRENE SULFONE) - SENSITIVE ION-MILLABLE POSITIVE ELECTRON-BEAM RESIST [J].
BOWDEN, MJ ;
THOMPSON, LF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) :1620-1623
[7]   VAPOR DEVELOPMENT OF POLY(OLEFIN SULFONE) RESISTS [J].
BOWDEN, MJ ;
THOMPSON, LF .
POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :525-528
[8]   ELECTRON-IRRADIATION OF POLY(OLEFIN SULFONES) - APPLICATION TO ELECTRON-BEAM RESISTS [J].
BOWDEN, MJ ;
THOMPSON, LF .
JOURNAL OF APPLIED POLYMER SCIENCE, 1973, 17 (10) :3211-3221
[9]   POLY(BUTENE-1 SULFONE) - HIGHLY SENSITIVE POSITIVE RESIST [J].
BOWDEN, MJ ;
THOMPSON, LF ;
BALLANTYNE, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1294-1296
[10]  
BOWDEN MJ, 1974, 6TH EL ION BEAM SCI, P81