SUBSTRATE ORIENTATION EFFECTS ON DOPANT INCORPORATION IN INP GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION (VOL 73, PG 4095, 1993)

被引:3
作者
BERGER, PR [1 ]
CHU, SNG [1 ]
LOGAN, RA [1 ]
BYRNE, E [1 ]
COBLENTZ, D [1 ]
LEE, J [1 ]
HA, NT [1 ]
DUTTA, NK [1 ]
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
关键词
D O I
10.1063/1.358542
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:2562 / 2562
页数:1
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[1]   SUBSTRATE ORIENTATION EFFECTS ON DOPANT INCORPORATION IN INP GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
BERGER, PR ;
CHU, SNG ;
LOGAN, RA ;
BYRNE, E ;
COBLENTZ, D ;
LEE, J ;
HA, NT ;
DUTTA, NK .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (08) :4095-4097