SPUTTERING AND SURFACE-COMPOSITION MODIFICATIONS OF TI DOPED GRAPHITE RG-TI AT TEMPERATURES UP TO 2000-K

被引：36
作者：
GARCIAROSALES, C
ROTH, J
BEHRISCH, R
机构：
[1] Max-Planck-Institut für Plasmaphysik, Euratom Association, München
来源：
JOURNAL OF NUCLEAR MATERIALS | 1994年 / 212卷 / pt B期
关键词：
D O I：
10.1016/0022-3115(94)91023-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Surface composition changes, sputtering yields, and hydrogen trapping and release at D-ion bombardment with energies between 50 eV and 1 keV at temperatures up to 2000 K have been investigated with well defined ion beams for the Ti doped graphite RG-Ti (1.7 at% Ti). Due to its high thermal conductivity and thermal shock resistance this material represents a promising candidate for use at high heat load plasma facing areas, such as limiters and divertor plates.
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页码：1211 / 1217
页数：7
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